Our in-house materials department is run by our hand-picked team of the best and brightest in their field. Our on-site equipment consists of a Class 100 (ISO 5) cleanroom with state-of-the-art synthesis equipment – capable of producing novel nanomaterials – and electrical characterisation equipment capable of measuring the properties of these materials.
In addition we have a standard materials lab with two box furnaces, one tube furnace and a VSP300 Bio-Logic Potentiostat capable of measuring electrical properties of supercapacitors.
Our equipment includes:
Picosun R200 Atomic Layer Deposition (ALD) Reactor: capable of depositing sub-nanometer layers in a controlled manner, conformally over 200 mm diameter wafers.
Probe Station with vibration table, 4294A HP impedance analyser, and 2601B Keithley SMU: capable of measuring the dielectric and IV response of materials.
M2000V Woollam Rotating Compensator Ellipsometer with automated mapping table: capable of measuring nanometric thin films accurately. Can also be used in-situ with the ALD reactor to measure growth of thin films during the depositing process.
M307 Moorfield thermal evaporator: used for depositing metal electrodes on samples.
Phenom ProX scanning electron microscope (SEM): with sub 10 nm resolution and fully integrated energy dispersive X-ray spectroscopy for elemental analysis. An optical magnification range 80 – 130,000 is capable from the built in digital camera. Is also capable of imaging of non-conductive samples.
State-of-the-art Rigaku Miniflex benchtop X-ray diffractometer (XRD) capable of performing phase ID, against the Crystallography Open Database (COD), and quantitative analysis of the relative abundance of crystalline compounds in powder mixtures. Other features include advanced Rietveld analysis, can also work with polycrystalline or textured powder samples temperature ranges from room temperature to 400°C.